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Vertical Furnace

Lead is an expert in the field of semiconductor furnace
equipment manufacturing and refurbishment.

VULCAN Furnace Leads New Innovation

VULCAN Furnace is leading the innovation in wafer diffusion process.

Wafer Size
150~200mm
Production Wafers
150
Process Application
  • Super High Temp Oxidation (1350~1400℃)
  • High Temp Oxidation (1200~1250℃)
  • Oxidation
  • Anneal
  • H2-Alloy
  • Pocl3
  • PSPI Cure
  • D-POLY
  • POLY
  • NITIDE
  • HTO
  • TEOS
  • ALD
System Dimension
900(W)×4200(L)×3080(H)
Heater Temperature Control Zone
5 Zones
Temperature Flat Zone
860mm
Wafers Loading
Full Automation
Wafers Mapping Sensor
Installed
Main Software Control
PLC + PC Control
Boat Rotation
Installed
SECS, FDC Control