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Vertical⠀Furnace

반도체 Furnace 장비 제조 및 Refurbish 분야 전문가 리드

VULCAN Furnace Lead new innovation

Wafer 확산 공정에 새로운 혁신을 리드하는 VULCAN Furnace

Wafer Size
150~200mm
Production wafers
150
Process application
  • Super Hi temp Oxidation (1350~1400℃)
  • Hi temp oxidation (1200~1250℃)
  • Oxidation
  • Anneal
  • H2-Alloy
  • Pocl3
  • PSPI CURE
  • D-POLY
  • POLY
  • NITIDE
  • HTO
  • TEOS
  • ALD
System dimension
900(W)×4200(L)×3080(H)
Heater temp control Zone
5 Zone
Temp flat zone
860mm
Wafers loading
Full automation
Wafers mapping sensor
Installed
Main Software Control
PLC + PC control
Boat Rotation
Installed
SECS, FDC control