Vertical Furnace
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High Temperature & LP-CVD Vertical Furnace
| Hardware Spec | |
|---|---|
| Wafer Size | 4”~12” |
| Maximum Temperature |
1300 ℃ |
| Temperature uniformity |
800~1250℃ ± 0.5℃ |
| Process | Wet-Oxidation,Pocl3,BBR3,Nitride,D-Poly,Teos |
| Wafer capacity | 50 ~ 100 wafers/tube(Expandable) |
| System control | PLC & PC control base |
