Horizontal Furnace
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High Temperature Horizontal Furnace
| Hardware Spec | |
|---|---|
| Wafer Size | 4”~12” |
| Maximum Temperature |
1300 ℃ |
| Temperature uniformity |
600~1280℃ ± 0.5℃ |
| Process | Well Drive ,Wet-Oxidation,Pocl3,BBR3 |
| Wafer capacity | 50 ~ 150 wafers/tube (Expandable) |
| System control | PLC & PC control base |
