Semiconductor Equipment & Parts Development

  • Contact

  • Tel : 043-231-7900~1

    Fax : 043-231-7902

    Email
        Furnace : kgw@lead-eng.co.kr
        CVD : chaos@lead-eng.co.kr

Vertical Furnace

High Temperature & LP-CVD Vertical Furnace

Hardware Spec
Wafer Size 4”~12”
Maximum
Temperature
1300 ℃
Temperature
uniformity
800~1250℃ ± 0.5℃
Process Wet-Oxidation,Pocl3,BBR3,Nitride,D-Poly,Teos
Wafer capacity 50 ~ 100 wafers/tube(Expandable)
System control PLC & PC control base