Semiconductor Equipment & Parts Development

  • Contact

  • Tel : 043-231-7900~1

    Fax : 043-231-7902

    Email
        Furnace : kgw@lead-eng.co.kr
        CVD : chaos@lead-eng.co.kr

Horizontal Furnace

High Temperature Horizontal Furnace

Hardware Spec
Wafer Size 4”~12”
Maximum
Temperature
1300 ℃
Temperature
uniformity
600~1280℃ ± 0.5℃
Process Well Drive ,Wet-Oxidation,Pocl3,BBR3
Wafer capacity 50 ~ 150 wafers/tube (Expandable)
System control PLC & PC control base